HomeEducationIIT Kanpur records highest intellectual property rights filings in 2024

IIT Kanpur records highest intellectual property rights filings in 2024

IIT Kanpur sets a record with 152 IPR filings in 2024, including patents and global applications. Discover its innovative contributions to medtech, nanotechnology, and impactful technology transfer.

January 03, 2025 / 12:47 IST
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IIT Kanpur
IIT Kanpur

The Indian Institute of Technology Kanpur (IITK) filed 152 Intellectual Property Rights (IPRs) in 2024, marking its highest annual total to date. This is part of a consistent increase in filings over the past four years. IIT Kanpur’s cumulative IPR filings have now reached 1,200, reflecting its active role in contributing to the research and development ecosystem.

The 2024 filings include 124 patents, 10 design registrations, 2 copyrights, and 6 trademark applications. The institute also expanded its global presence with seven US patents, two Chinese patents, and one European patent. These IPRs cover a broad spectrum of technological fields, including medtech and nanotechnology. Notable innovations include a transdermal drug delivery patch, a cryptographic accelerator called Kryptoceler, a chop saw metal-cutting machine, and a contactless automated tool for measuring crack growth.

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In addition to its new filings, IIT Kanpur saw 217 previously filed IPRs granted in 2024. These include patents for a smart electric meter, a portable medical suction device, a folding quadcopter drone, a broadband orbital angular momentum detector for quantum technologies, and a process for fabricating ultra-thin polymer composite electrolytes.

Technology transfer activities at the institute continued to progress, with seven technologies licensed to industry partners. IIT Kanpur also introduced two new products in 2024: an air sampling device and a metamaterial cloaking system. These developments reflect ongoing efforts to bridge the gap between academic research and practical applications in areas such as environmental monitoring and advanced materials.