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Jun 05, 2012, 10.45 AM IST
Sharp Corporation have jointly developed a new oxide semiconductor (IGZO) technology with high crystallinity. This material will enable even higher
Sharp Corporation have jointly developed a new oxide semiconductor (IGZO) technology with high crystallinity. This material will enable even higher resolutions, lower power consumption, and higher performance touchscreens, as well as narrower bezel widths for LCD display panels used on mobile devices, such as smartphones. This jointly developed new IGZO technology imparts crystallinity in an oxide semiconductor composed of indium (In), gallium (Ga) and zinc (Zn). Compared to current amorphous IGZO semiconductors, it enables even smaller thin-film transistors to be achieved and provides higher performance. |
 Kobian unveils Mercury mTab7G tablet with SIM calling functionality 
Kobian has unveiled its new tablet, dubbed the Mercury mTab7G. The ultra-thin... Monaco: What's Yours is Mine Review With the recent dearth of full-blown AAA games, we figured it'd be a great 
EDITOR’S RATING 8.5 USER RATING 6.5 |
